Modeling inductively coupled plasmas: The coil current boundary condition

نویسندگان

  • Benjamin W. Yu
  • Steven L. Girshick
چکیده

In modeling inductively coupled plasmas, the boundary condition for the electromagnetic field equations can be treated by specifying either the current in the induction coil or the total power dissipated in the plasma. This paper presents a method for using the coil current boundary condition. An advantage of using the coil current boundary condition is that coil current, unlike plasma power dissipation, is easily measured; in this approach the plasma power dissipation is an outcome of the calculation. The results of sample calculations are presented, covering a range of coil currents from 59 to 110 A. The conditions of the calculations correspond to experimental argon plasmas at atmospheric pressure and at 3.0 MHz frequency. The calculated isotherms are in good qualitative agreement with photographs of the laboratory plasmas.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Emission of electron Bernstein waves in plasmas

Related Articles The effects of neutral gas heating on H mode transition and maintenance currents in a 13.56MHz planar coil inductively coupled plasma reactor Phys. Plasmas 19, 093501 (2012) Collisionless inter-species energy transfer and turbulent heating in drift wave turbulence Phys. Plasmas 19, 082309 (2012) Development of a low-energy and high-current pulsed neutral beam injector with a wa...

متن کامل

Low Temperature Plasma Technology Laboratory Physical Mechanisms in Industrial RF Plasma Sources

RF plasma sources are essential for producing semiconductor chips, but they are developed empirically, with incomplete knowledge of how they work. Inductively coupled plasmas (ICPs) employ rf fields without a dc magnetic field B0 and produce ionization well outside the skin layer. Helicon sources with a B0 can generate much higher densities but pose a number of puzzling physical questions. Of t...

متن کامل

Online tuning of impedance matching circuit for long pulse inductively coupled plasma source operation--an alternate approach.

Impedance matching circuit between radio frequency (RF) generator and the plasma load, placed between them, determines the RF power transfer from RF generator to the plasma load. The impedance of plasma load depends on the plasma parameters through skin depth and plasma conductivity or resistivity. Therefore, for long pulse operation of inductively coupled plasmas, particularly for high power (...

متن کامل

Gas-phase studies in inductively coupled fluorocarbon plasmas

Quantitative results from infrared laser absorption spectroscopy ~IRLAS! of CF and CF2 radicals and COF2 products in inductively coupled plasmas fed with C2F6, CHF3 and C4F8 are presented and compared with results simultaneously obtained by mass spectrometry and optical emission spectroscopy. These plasma gas-phase analysis results are discussed and compared to fluorocarbon deposition and etchi...

متن کامل

A three-dimensional model for inductively coupled plasma etching reactors: Azimuthal symmetry, coil properties, and comparison to experiments

Inductively coupled plasma ~ICP! etching reactors are rapidly becoming the tool of choice for low gas pressure, high plasma density etching of semiconductor materials. Due to their symmetry of excitation, these devices tend to have quite uniform etch rates across the wafer. However, side to side and azimuthal variations in these rates have been observed, and have been attributed to various asym...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 1999